TY  - BOOK
AU  - Kim,Young-Hee
AU  - Lee,Jack Chung-Yeung
ED  - Morgan & Claypool Publishers.
TI  - Hf-based high-k dielectrics: process development, performance characterization, and reliability 
SN  - 9781598293548 (hbk.)
AV  - QC585 .K56 2005
U1  - 537.24 21
PY  - 2005///
CY  - San Rafael, Calif.
PB  - Morgan & Claypool Publishers
KW  - Dielectrics
KW  - Hafnium oxide
KW  - Integrated circuits
KW  - Reliability
KW  - Semiconductors
KW  - Junctions
KW  - Breakdown (Electricity)
KW  - Metal oxide semiconductor field-effect transistors
N1  - Title from PDF t.p. (viewed on Dec. 2, 2005); Includes bibliographical references; Online version restricted to NUS staff and students only through NUSNET
ER  -