Kim, Young-Hee, 1972-
Hf-based high-k dielectrics : process development, performance characterization, and reliability / Young-Hee Kim, Jack C. Lee. - San Rafael, Calif. : Morgan & Claypool Publishers, c2005. - x, 92 p. : ill. ; 24 cm.
Title from PDF t.p. (viewed on Dec. 2, 2005)
Includes bibliographical references.
Online version restricted to NUS staff and students only through NUSNET.
Mode of access: World Wide Web.
System requirements: Internet connectivity; World Wide Web browser.
9781598293548 (hbk.) 1598290045 (hbk.)
Dielectrics.
Hafnium oxide.
Integrated circuits--Reliability.
Semiconductors--Junctions.
Breakdown (Electricity)
Metal oxide semiconductor field-effect transistors.
QC585 / .K56 2005
537.24 / KIM 2005
Hf-based high-k dielectrics : process development, performance characterization, and reliability / Young-Hee Kim, Jack C. Lee. - San Rafael, Calif. : Morgan & Claypool Publishers, c2005. - x, 92 p. : ill. ; 24 cm.
Title from PDF t.p. (viewed on Dec. 2, 2005)
Includes bibliographical references.
Online version restricted to NUS staff and students only through NUSNET.
Mode of access: World Wide Web.
System requirements: Internet connectivity; World Wide Web browser.
9781598293548 (hbk.) 1598290045 (hbk.)
Dielectrics.
Hafnium oxide.
Integrated circuits--Reliability.
Semiconductors--Junctions.
Breakdown (Electricity)
Metal oxide semiconductor field-effect transistors.
QC585 / .K56 2005
537.24 / KIM 2005