Asia Pacific University Library catalogue

Hf-based high-k dielectrics : process development, performance characterization, and reliability / Young-Hee Kim, Jack C. Lee.

By: Kim, Young-Hee, 1972-Contributor(s): Lee, Jack Chung-Yeung | Morgan & Claypool PublishersMaterial type: TextTextPublication details: San Rafael, Calif. : Morgan & Claypool Publishers, c2005Description: x, 92 p. : ill. ; 24 cmISBN: 9781598293548 (hbk.); 1598290045 (hbk.)Subject(s): Dielectrics | Hafnium oxide | Integrated circuits -- Reliability | Semiconductors -- Junctions | Breakdown (Electricity) | Metal oxide semiconductor field-effect transistorsDDC classification: 537.24 LOC classification: QC585 | .K56 2005
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Book QC585 .K56 2005 c.1 (Browse shelf (Opens below)) 1 Available (No use restrictions) 00022963

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