Hf-based high-k dielectrics : process development, performance characterization, and reliability / Young-Hee Kim, Jack C. Lee.
Material type:
TextPublication details: San Rafael, Calif. : Morgan & Claypool Publishers, c2005Description: x, 92 p. : ill. ; 24 cmISBN: 9781598293548 (hbk.); 1598290045 (hbk.)Subject(s): Dielectrics | Hafnium oxide | Integrated circuits -- Reliability | Semiconductors -- Junctions | Breakdown (Electricity) | Metal oxide semiconductor field-effect transistorsDDC classification: 537.24 LOC classification: QC585 | .K56 2005
| Item type | Current library | Collection | Call number | Copy number | Status | Date due | Barcode |
|---|---|---|---|---|---|---|---|
General Circulation
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APU Library Open Shelf | Book | QC585 .K56 2005 c.1 (Browse shelf (Opens below)) | 1 | Available (No use restrictions) | 00022963 |
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